Research ArticleNANOTECHNOLOGY

Approaching the ideal elastic strain limit in silicon nanowires

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Science Advances  17 Aug 2016:
Vol. 2, no. 8, e1501382
DOI: 10.1126/sciadv.1501382

Article Information

vol. 2 no. 8

Online ISSN: 
History: 
  • Received for publication October 4, 2015
  • Accepted for publication June 29, 2016

Author Information

  1. Hongti Zhang1,2,
  2. Jerry Tersoff3,
  3. Shang Xu1,4,
  4. Huixin Chen5,
  5. Qiaobao Zhang1,
  6. Kaili Zhang1,
  7. Yong Yang5,
  8. Chun-Sing Lee4,6,
  9. King-Ning Tu7,*,
  10. Ju Li8,* and
  11. Yang Lu1,2,4,9,*
  1. 1Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Hong Kong Special Administrative Region (SAR) 999077, China.
  2. 2Centre for Advanced Structural Materials, City University of Hong Kong, Hong Kong SAR 999077, China.
  3. 3IBM T. J. Watson Research Center, Yorktown Heights, NY 10598, USA.
  4. 4Centre of Super-Diamond and Advanced Films, City University of Hong Kong, Hong Kong SAR 999077, China.
  5. 5State Key Laboratory of Physical Chemistry of Solid Surfaces, Department of Chemistry, Xiamen University, Xiamen 361005, China.
  6. 6Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR 999077, China.
  7. 7Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, CA 90095, USA.
  8. 8Department of Nuclear Science and Engineering and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
  9. 9Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, China.
  1. *Corresponding author. Email: kntu{at}ucla.edu (K.-N.T.); liju{at}mit.edu (J.L.); yanglu{at}cityu.edu.hk (Y.L.)

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