Research ArticleMATERIALS SCIENCE

Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

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Science Advances  18 Jan 2019:
Vol. 5, no. 1, eaau7886
DOI: 10.1126/sciadv.aau7886

Article Information

vol. 5 no. 1

Online ISSN: 
History: 
  • Received for publication July 16, 2018
  • Accepted for publication December 6, 2018

Author Information

  1. Neeraj Dwivedi1,*,
  2. Reuben J. Yeo1,2,
  3. Chetna Dhand3,
  4. Jared Risan4,
  5. Richard Nay4,
  6. Sudhiranjan Tripathy5,
  7. Sukumar Rajauria6,
  8. Mohammad S. M. Saifullah5,
  9. Subramanian K. R. S. Sankaranarayanan7,
  10. Hyunsoo Yang1,
  11. Aaron Danner1 and
  12. Charanjit S. Bhatia1,*
  1. 1Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Republic of Singapore.
  2. 2Institute of Materials, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland.
  3. 3Singapore Eye Research Institute, Singapore 169856, Republic of Singapore.
  4. 4Hysitron Inc., 10025 Valley Road, Minneapolis, MN 55344, USA.
  5. 5Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology, and Research), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore.
  6. 6Western Digital Company, Recording Sub System Staging and Research, San Jose, CA 95135, USA.
  7. 7Center for Nanoscale Materials, Argonne National Laboratory, 9700 S Cass Avenue, Argonne, IL 60439, USA.
  1. *Corresponding author. Email: neerajdwivedi6{at}gmail.com (N.D.); elebcs{at}nus.edu.sg (C.S.B.)

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