Research ArticleMATERIALS SCIENCE

Shear-solvo defect annihilation of diblock copolymer thin films over a large area

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Science Advances  14 Jun 2019:
Vol. 5, no. 6, eaaw3974
DOI: 10.1126/sciadv.aaw3974

Article Information

vol. 5 no. 6

Online ISSN: 
History: 
  • Received for publication December 17, 2018
  • Accepted for publication May 3, 2019
  • .

Author Information

  1. Ye Chan Kim1,
  2. Tae Joo Shin2,
  3. Su-Mi Hur3,*,
  4. Seok Joon Kwon4,* and
  5. So Youn Kim1,*
  1. 1School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea.
  2. 2UNIST Central Research Facilities and School of Natural Science, UNIST, Ulsan 44919, Republic of Korea.
  3. 3School of Polymer Science and Engineering, Chonnam National University, Gwangju 61186, Republic of Korea.
  4. 4Nanophotonics Research Center, Korea Institute of Science and Technology, Seongbuk-Gu, Seoul 02792, Republic of Korea.
  1. *Corresponding author. Email: shur{at}chonnam.ac.kr (S.-M.H.); cheme{at}kist.re.kr (S.J.K.); soyounkim{at}unist.ac.kr (S.Y.K.)

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