Research ArticleMATERIALS SCIENCE

Ultimate suppression of thermal transport in amorphous silicon nitride by phononic nanostructure

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Science Advances  25 Sep 2020:
Vol. 6, no. 39, eabc0075
DOI: 10.1126/sciadv.abc0075

Article Information

vol. 6 no. 39

PubMed: 
Online ISSN: 
History: 
  • Received for publication April 1, 2020
  • Accepted for publication August 11, 2020
  • .

Author Information

  1. Naoki Tambo1,*,,
  2. Yuxuan Liao2,*,
  3. Chun Zhou3,
  4. Elizabeth Michiko Ashley3,
  5. Kouhei Takahashi1,
  6. Paul F. Nealey3,4,
  7. Yasuyuki Naito1 and
  8. Junichiro Shiomi2,
  1. 1Technology Division, Panasonic Corporation, Kyoto, Japan.
  2. 2Department of Mechanical Engineering, The University of Tokyo, Tokyo, Japan.
  3. 3Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.
  4. 4Materials Science Division, Argonne National Laboratory, Argonne, IL, USA.
  1. Corresponding author. Email: tambo.naoki{at}jp.panasonic.com (N.T.); shiomi{at}photon.t.u-tokyo.ac.jp (J.S.)
  • * These authors contributed equally to this work.

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