Science Advances

Supplementary Materials

This PDF file includes:

  • fig. S1. Comparative analysis of the orthogonal ridge pattern in different generation methods.
  • fig. S2. Scanning electron microscopy image of a maze microparticle (scale bar, 10 μm).
  • fig. S3. Uniqueness of orthogonal patterns.
  • fig. S4. Ridge organization in a sigma tessellation.
  • fig. S5. Microparticle design for studying the guiding effect.
  • fig. S6. Controlling the anisotropic structure.
  • fig. S7. Inscribing letters with wrinkles.
  • fig. S8. Control of the code complexity.
  • Legend for movie S1

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Other Supplementary Material for this manuscript includes the following:

  • movie S1 (.avi format). Generation of the guided wrinkles.

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