Science Advances

Supplementary Materials

This PDF file includes:

  • Section S1. A temporal evolution of the structural order in SS-annealed BCP thin films
  • Section S2. Effects of initial shearing temperature for SS annealing on BCP thin films
  • Section S3. Analysis of peak broadening of a small-angle scattering peak as a function of fluctuations in the domain spacing and line width of 1D line-and-space patterns
  • Section S4. Calculation of the orientational order and correlation of self-assembled BCP thin films
  • Section S5. Detection and quantification of areal and number density of topological defects in self-assembled BCP thin films
  • Section S6. Calculation of the SPU of self-assembled patterns
  • Section S7. Gabor filtering and convolution for the measurement of the uniformity of self-assembled patterns in BCP thin films
  • Section S8. Measurement of the LER and LWR of self-assembled patterns
  • Section S9. Experimental details of SVA and swelling of BCP thin films
  • Section S10. Long-time SS annealing effects on the morphological stability and orientational order of BCP thin films
  • Section S11. Comparison of the domain spacing of BCP thin films with different film thicknesses under thermal annealing
  • Section S12. Effects of ST annealing on the self-assembled patterns in BCP thin films
  • Section S13. Comparison of morphological stability and structural order of BCP thin films annealed by different methods
  • Section S14. Large-area uniformity of self-assembled pattern of shear-only and SS-annealed BCP thin films
  • Section S15. UV-Vis-NIR reflectance of TE- and TM-polarized incident light from 1D metal nanowire array on the substrate
  • Fig. S1. A temporal evolution of the structural order in SS-annealed BCP thin films.
  • Fig. S2. Effects of initial shearing temperature and solvent vapor exposure time.
  • Fig. S3. Numerical calculation of broadening behavior of the primary scattering peak.
  • Fig. S4. Effects of the periodicity fluctuation of lamellae patterns on the small-angle scattering behavior.
  • Fig. S5. Procedure of orientation calculation and color mapping.
  • Fig. S6. Calculation of orientational correlation function, g(r).
  • Fig. S7. Procedure for original raw SEM image to precisely detect topological defects and measure their areal densities in the self-assembled pattern of BCP thin films.
  • Fig. S8. Procedure for the calculation of number density of the topological defects in the BCP thin films using the fingerprint analysis algorithm.
  • Fig. S9. Calculation of SPU.
  • Fig. S10. A measurement of a line-and-space pattern uniformity using a Gabor filter.
  • Fig. S11. Measurement of the LER and LWR of self-assembled BCP thin films using a commercially available software (SuMMIT).
  • Fig. S12. Swelling experiments of BCP and homopolymer thin films.
  • Fig. S13. Effects of SS annealing on the film stability and pattern uniformity of BCP thin films after long-time exposure to solvent.
  • Fig. S14. Calculation of domain d-spacing of thermally annealed BCP thin films with different film thicknesses.
  • Fig. S15. Experimental results for the self-assembled pattern quality of BCP thin films after ST annealing.
  • Fig. S16. Effects of different combinations of annealing methods on the structural order and film stability of BCP thin films.
  • Fig. S17. Comparison of large-area uniformity of self-assembled patterns of shear-only and SS-annealed BCP thin films.
  • Fig. S18. UV-Vis-NIR reflectance spectra from a 1D parallelly aligned array of gold nanowires.
  • Table S1. An algorithm for the calculation of SPU.
  • Table S2. Comparison of optimized condition and long-time SS annealing.
  • References (5361)

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