Science Advances

Supplementary Materials

The PDF file includes:

  • Fig. S1. Layer-number–dependent PL spectra (ML and bilayer) of MoS2 and WS2 films.
  • Fig. S2. OM images as different pitch sizes in patterned SiO2/p+-Si trenches.
  • Fig. S3. False-color SEM image of the FET devices on flat regions.
  • Fig. S4. Length-dependent resistance of 3D MoS2 ML films on microtrench substrates up to l mm.
  • Fig. S5. Length-dependent FET characteristics of 3D MoS2 ML films on microtrench substrates.
  • Fig. S6. PL intensity maps and the corresponding PL spectra of TMDC ML films on planar SiO2/p+-Si substrates.
  • Fig. S7. Raman mapping of 3D WS2 ML films on SiO2/p+-Si needle arrays.
  • Fig. S8. Raman and PL mapping of 3D MoS2 ML films on SiO2/p+-Si needle arrays.
  • Fig. S9. Second harmonic generation in MoS2.
  • Fig. S10. Schematic illustration of the DI water–assisted transfer of 3D TMDC membranes.
  • Fig. S11. TEM images of delaminated WS2 ML films on a TEM grid.
  • Fig. S12. Local diffraction patterns generated on the 3D WS2 membranes.
  • Fig. S13. PL and Raman spectra of MoS2 ML and WS2 ML films before and after delamination.
  • Fig. S14. Nonconformal MoS2 film growth on microtrench substrates by a powder CVD method.
  • Fig. S15. MOCVD growth of MoS2 films on 3D trench substrates at a faster growth rate.
  • Section S1. Pyramid structure analysis using the diffraction patterns
  • Section S2. Determination of sticking coefficients
  • Section S3. Powder CVD growth of MoS2 ML crystals
  • Legends for movies S1 and S2

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Other Supplementary Material for this manuscript includes the following:

  • Movie S1 (.avi format). Peeling off the WS2 ML films from the quartz substrates by immersing in DI water.
  • Movie S2 (.avi format). TEM tilting of suspended 3D WS2 membranes.

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