Science Advances

Supplementary Materials

Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry

Michael Tanksalvala, Christina L. Porter, Yuka Esashi, Bin Wang, Nicholas W. Jenkins, Zhe Zhang, Galen P. Miley, Joshua L. Knobloch, Brendan McBennett, Naoto Horiguchi, Sadegh Yazdi, Jihan Zhou, Matthew N. Jacobs, Charles S. Bevis, Robert M. Karl Jr., Peter Johnsen, David Ren, Laura Waller, Daniel E. Adams, Seth L. Cousin, Chen-Ting Liao, Jianwei Miao, Michael Gerrity, Henry C. Kapteyn, Margaret M. Murnane

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This PDF file includes:

  • Phase- and amplitude-sensitive imaging reflectometry: Theoretical sensitivity
  • Phase- and amplitude-sensitive imaging reflectometry: Numeric simulations
  • Future beamline optimization
  • Data collection at other incidence angles
  • Reconstruction challenges
  • Data preprocessing
  • Parallel ptychography code
  • Ptychography reconstruction
  • Phase-sensitive imaging reflectometry reconstructions
  • Image segmentation for producing reflectance versus angle curves
  • Composition reconstruction parameter selection
  • Reflectance calculation
  • Genetic algorithm used for composition reconstruction
  • Sensitivity of the phase-sensitive imaging reflectometer to more sample parameters
  • Figs. S1 to S12
  • Table S1
  • References

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